Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H<SUB>2</SUB> and CF<SUB>4</SUB> - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Plasma Sources Science and Technology Année : 2016

Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4

Bastien Bruneau
  • Fonction : Auteur
T. Gans
  • Fonction : Auteur
D. O'Connell
  • Fonction : Auteur
Arthur Greb
  • Fonction : Auteur
Ihor Korolov
  • Fonction : Auteur
A. Derzsi
  • Fonction : Auteur
Z. Donkó
  • Fonction : Auteur
S. Brandt
  • Fonction : Auteur
E. Schüngel
  • Fonction : Auteur
J. Schulze
  • Fonction : Auteur
P. Diomede
  • Fonction : Auteur
D. J. Economou
  • Fonction : Auteur
S. Longo
  • Fonction : Auteur
E.V. Johnson
Jean-Paul Booth

Résumé

Tailored voltage excitation waveforms provide an efficient control of the ion energy (through the electrical asymmetry effect) in capacitive plasmas by varying the ?amplitude? asymmetry of the waveform. In this work, the effect of a ?slope? asymmetry of the waveform is investigated by using sawtooth-like waveforms, through which the sheath dynamic can be manipulated. A remarkably different discharge dynamic is found for Ar, H 2 , and CF 4 gases, which is explained by the different dominant electron heating mechanisms and plasma chemistries. In comparison to Argon we find that the electrical asymmetry can even be reversed by using an electronegative gas such as CF 4 . Phase resolved optical emission spectroscopy measurements, probing the spatiotemporal distribution of the excitation rate show excellent agreement with the results of particle-in-cell simulations, confirming the high degree of correlation between the excitation rates with the dominant heating mechanisms in the various gases. It is shown that, depending on the gas used, sawtooth-like voltage waveforms may cause a strong asymmetry.

Dates et versions

hal-01549332 , version 1 (28-06-2017)

Identifiants

Citer

Bastien Bruneau, Trevor Lafleur, T. Gans, D. O'Connell, Arthur Greb, et al.. Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4. Plasma Sources Science and Technology, 2016, 25 (1), pp.01LT02. ⟨10.1088/0963-0252/25/1/01LT02⟩. ⟨hal-01549332⟩
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