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Communication Dans Un Congrès Année : 2016

Highly-Efficient Subwavelength Engineered Grating Couplers for Silicon-on-Insulator Waveguides

Résumé

We present experimental results of efficient subwavelength index engineered surface grating couplers, developed in a standard 220-nm SOI substrate. Grating couplers are fabricated using a single full etch or a dual etch process (full etch and 70nm shallow etch). The measured efficiency of -2.2 dB, -2.5 dB, and -0.7 dB are reported for single-etch couplers without and with metal reflector in the near-IR wavelengths. We demonstrate a peak coupling efficiency of -1.3 dB for a novel and flexible dual-etch grating coupler with interleaved deep and shallow etched trenches.
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Dates et versions

hal-01527629 , version 1 (31-05-2017)

Identifiants

  • HAL Id : hal-01527629 , version 1

Citer

D Benedikovic, C Alonso-Ramos, P Cheben, J Schmid, S Wang, et al.. Highly-Efficient Subwavelength Engineered Grating Couplers for Silicon-on-Insulator Waveguides. 18th European Conference in Integrated Optics (ECIO 2016), May 2016, Varsovie, Poland. ⟨hal-01527629⟩
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