SIOxNy – SINx DOUBLE ANTIREFLECTION LAYER FOR MULTICRYSTALLINE SILICON SOLAR CELLS
Résumé
In order to enhance photon transmission into multicrystalline silicon solar cells, double-layer antire-flection coatings (ARC) were simulated using the measured optical constants of hydrogenated silicon oxynitride SiO x N y :H and hydrogenated silicon nitride SiN x :H layers deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD). On polished surfaces, these optimized structures have the potential to increase the short-circuit current by more than 2% for non-encapsulated cells and up to 0.5% for encapsulated cells, in comparison with the standard single SiN x :H ARC. Industrial multicrystalline silicon solar cells were fabricated in order to validate the simulations. In spite of an inhomogeneous NaOH textured surface, the short-circuit current have shown an increase up to 2.3%, which highlights the potential of such structures for laboratory high-efficiency solar cells.
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2CV.2.59 - J. Dupuis - SiOxNy, SiNx double anti-reflection layer for multicrystalline silicon solar cells - Paper.pdf (218.87 Ko)
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