Diazene-Functionalized Lamellar Materials as Nanobuilding Blocks: Application as Light-Sensitive Fillers to Initiate Radical Photopolymerizations

Cyrielle Dol (1) , François Vibert (1) , Michèle P. Bertrand (1) , Jacques Lalevée (2) , Stéphane Gastaldi (1) , Eric Besson (1)

1 ICR - Institut de Chimie Radicalaire
2 IS2M - Institut de Science des Matériaux de Mulhouse

New polysilsesquioxane-based lamellar materials, functionalized with radical precursors, were synthesized. They play a double role in the prepa-ration of composite materials: first, as filler homogenously dispersed in the monomer after delamination, second as radical initiator in photopol-ymerization. These polysilsesquioxanes enable fast and efficient photopolymerization upon UV light for thick samples. High conversions in monomers as well as the formation of hybrid polymers covalently linked to the filler are observed. This strategy, based on a double bottom-up approach, avoids the solubility/dispersion problem encountered in the classical preparation of composite polymers from pre-formed organic polymers.

Domaines: Chimie organique

Cyrielle Dol, François Vibert, Michèle P. Bertrand, Jacques Lalevée, Stéphane Gastaldi, et al.. Diazene-Functionalized Lamellar Materials as Nanobuilding Blocks: Application as Light-Sensitive Fillers to Initiate Radical Photopolymerizations. ACS Macro Letters, 2017, 6 (2), pp.117 - 120. ⟨10.1021/acsmacrolett.6b00949⟩. ⟨hal-01491849⟩