Impact of resistive paths on NVM array reliability: Application to Flash & ReRAM memories

P. Canet (1) , J. Postel-Pellerin (1) , Hassen Aziza (1)

1 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence

In memory technology, size reduction induces consequences in terms of reliability, including an increase in the line resistances and a voltage drop along the line during memory operation. This problem can occur in Flash products during sector erase mode, and in resistive RAM (ReRAM) during forming, reset or word-reading modes. In this paper we apply a simple resistive model to determine the wordline (or bitline) length of a Flash memory (and thus to optimize the Flash memory array's size) or the word length of a ReRAM, according to specific reliability criteria: the threshold voltage drop of cells along a line in a Flash memory sector, or the resistance variation of the cells in a ReRAM word. For the technologies considered in this paper, on the one hand we demonstrate a maximal threshold voltage drop of 2 V for a 4 Gbit Flash array and we provide design recommendations, and on the other hand we demonstrate that a maximal word length of 32 bits for ReRAM can be achievable in a ReRAM matrix. The presented methodology can easily be extended to any memory technology. (C) 2016 Elsevier Ltd. All rights reserved.

Domaines: Micro et nanotechnologies/Microélectronique

P. Canet, J. Postel-Pellerin, Hassen Aziza. Impact of resistive paths on NVM array reliability: Application to Flash & ReRAM memories. Microelectronics Reliability, 2016, 64 (SI), pp.36-41. ⟨10.1016/j.microrel.2016.07.096⟩. ⟨hal-01434941⟩