Far-and mid-infrared properties of carbon layers elaborated by plasma sputtering

Benoit Rousseau (1) , Mohamed Ramzi Ammar (2) , Denis Bormann (2) , Patrick Simon (2) , Hervé Rabat (3) , Pascal Brault (3)

1 LTN - Laboratoire de thermocinétique [Nantes]
2 CEMHTI - Conditions Extrêmes et Matériaux : Haute Température et Irradiation
3 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés

The far-and mid-infrared reflectivity spectra of two carbon layers deposited on pure (100) silicon substrates by DC magnetron sputtering were investigated at room temperature in the 10-5000 cm-1 wavenumber range. Their structural and textural features were also studied by combining Raman spectroscopy, Field Emission Scanning Electron Microscopy (FESEM), High Resolution Transmission Electron Microscopy (HRTEM), X-Ray Reflectivity (XRR) and Rutherford Backscattering Spectroscopy (RBS). The set of results was used to discuss afterwards the influence of the texture on the infrared properties at varying length scale. Thereby, the two layers were found to be heterogeneous as assessed by RBS, XRR and FESEM and their thicknesses had been measured by XRR and FESEM. The information on the structural organization and " crystallite " size was given by Raman spectroscopy. The influence of both the textural and structural parameters on the measured infrared reflectivity spectra was discussed. Finally, a methodology was proposed to recover the intrinsic index of refraction and the intrinsic index of absorption of each layer.

Mots clés: Infrared reflectivity; sputtering deposition; Carbon films; radiative properties; Raman spectroscopy

Domaines: Plasmas; Matériaux

Benoit Rousseau, Mohamed Ramzi Ammar, Denis Bormann, Patrick Simon, Hervé Rabat, et al.. Far-and mid-infrared properties of carbon layers elaborated by plasma sputtering. Applied Surface Science, 2016, 390, pp.1002-1008. ⟨10.1016/j.apsusc.2016.07.165⟩. ⟨hal-01349935⟩