Advance in low-k cryogenic etching of porous organoscilicate : Investigation of a new gas with higher boiling point Organic (HBPO) and comparison with C4F8

Floriane Leroy (1) , Nataniel Brochu , Romain Chanson , Remi Dussart (1) , Thomas Tillocher (1) , Jean-Francois de Marneffe (2) , Liping Zhang (2) , Kaoru Maekawa (3) , Koichi Yatsuda (3) , Tahara Shigeru , Christian Dussarrat (4)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 IMEC - IMEC
3 TEL - Tokyo Electron
4 CTAS - Centre Technique des Applications du Soudage

Domaines: Physique des plasmas [physics.plasm-ph]

Floriane Leroy, Nataniel Brochu, Romain Chanson, Remi Dussart, Thomas Tillocher, et al.. Advance in low-k cryogenic etching of porous organoscilicate : Investigation of a new gas with higher boiling point Organic (HBPO) and comparison with C4F8. Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France. ⟨hal-01344722⟩