Investigation on low thermal emittance of Al films deposited by magnetron sputtering.

Yuping Ning (1) , Wenwen Wang (1) , Ying Sun (1) , Yongxin Wu (1) , Yingfang Liu (1) , Hongliang Man (1) , Cong Wang (1, 2) , Yong Zhang (3) , Shuxi Zhao (4) , Eric Tomasella (5) , Angélique Bousquet (5)

1 Center for Condensed Matter and Materials Physics, Department of Physics, Beihang University, Beijing
2 Pneumatic and Thermodynamic Energy Storage and Supply Beijing Key Laboratory, Beijing
3 State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing
4 Angström Laboratory
5 ICCF - Institut de Chimie de Clermont-Ferrand

A series of Al films with different thicknesses were deposited on polished stainless steel by direct current (DC) magnetron sputtering as a metal IR-reflector layer in solar selective absorbing coating (SSAC). The effects of the film thickness and the temperature on the thermal emittance of the Al films are studied. An optimal thickness 78 nm of the Al film for the lowest total thermal emittance is obtained. The thermal emittance of the optimal Al film keeps close to 0.02 from 25 °C to 400 °C, which are low enough to satisfy the optical requirements in SSAC. The optical constants of the Al film are deduced by fitting the reflectance and transmission spectra using SCOUT software.

Mots clés: Al film; Thermal emittance; Film thickness; Optical constant

Domaines: Chimie

Yuping Ning, Wenwen Wang, Ying Sun, Yongxin Wu, Yingfang Liu, et al.. Investigation on low thermal emittance of Al films deposited by magnetron sputtering.. Infrared Physics and Technology, 2016, 75, pp.133-138. ⟨10.1016/j.infrared.2016.01.007⟩. ⟨hal-01334178⟩