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Ge-rich silicon germanium as a new platform for optical interconnects on silicon

Abstract : We propose germanium-rich silicon-germanium (SiGe) as a new platform for optical interconnects. The platform viability is experimentally and theoretically investigated through the realization of main building blocks of passive circuitry. Germanium-rich Si 1-x Ge x guiding layer on a graded SiGe layer is used to experimentally show 12µm radius bends by light confinement tuning at a wavelength of 1550nm. As a next step, Mach Zehnder interferometer with 10 dB extinction ratio is demonstrated. High Ge content of the proposed platform allows the coupling with Ge-based active devices, relying on a high quality epitaxial growth. Hence, the integration on Silicon of high speed and low power consumption Ge-rich active components is possible, despite the high lattice mismatch between silicon and germanium.
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https://hal.archives-ouvertes.fr/hal-01322121
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Submitted on : Friday, May 27, 2016 - 8:45:05 AM
Last modification on : Tuesday, August 13, 2019 - 11:10:03 AM
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Vladyslav Vakarin, Papichaya Chaisakul, Jacopo Frigerio, Andrea Ballabio, Xavier Le Roux, et al.. Ge-rich silicon germanium as a new platform for optical interconnects on silicon. SPIE Photonics Europe, Apr 2016, Bruxelles, Belgium. ⟨10.1117/12.2228731⟩. ⟨hal-01322121⟩

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