Structure and chemical properties of molybdenum oxide thin films

C. V. Ramana , V. V. Atuchin , L. D. Pokrovsky , U. Becker , C. M. Julien (1)

1 INSP - Institut des Nanosciences de Paris

Molybdenum oxide (MoO3) exhibits interesting structural, chemical, electrical, and optical properties, which are dependent on the growth conditions and the fabrication technique. In the present work, MoO3 films were produced by pulsed-laser deposition and dc magnetron sputtering under varying conditions of growth temperature (T-s) and oxygen pressure (pO(2)). The effect of growth conditions on the structure and chemical properties of MoO3 films was examined using x-ray diffraction, reflection high-energy electron diffraction, x-ray photoelectron spectroscopy, and infrared spectroscopic measurements. The analyses indicate that the microstructure of Mo oxide films is sensitive to T-s and PO2. The growth conditions were optimized to produce stoichiometric and highly textured polycrystalline MoO3 films. A comparison of the microstructure of MoO3 films grown using pulsed-laser deposition and sputtering methods is also presented. (c) 2007 American Vacuum Society.

Domaines: Matière Condensée [cond-mat]

C. V. Ramana, V. V. Atuchin, L. D. Pokrovsky, U. Becker, C. M. Julien. Structure and chemical properties of molybdenum oxide thin films. Journal of Vacuum Science & Technology A, 2007, 25 (4), pp.1166-1171. ⟨10.1116/1.2747628⟩. ⟨hal-01281558⟩