Pulsed-laser deposited LiNi0.8Co0.15Al0.05O2 thin films for application in microbatteries

C. V. Ramana , K. Zaghib (1) , C. M. Julien (2)

1 Institut de Recherches d'Hydro-Quebec
2 INSP - Institut des Nanosciences de Paris

LiNi0.8Co0.15Al0.05O2 thin films were prepared by pulsed-laser deposition at varying growth conditions. It was found that the growth and microstructure of the films is highly dependent on the target composition, deposition temperature, and the reactive atmosphere during laser ablation. The x-ray diffraction and Raman spectroscopic measurements indicated the high-structural quality of the grown LiNi0.8Co0.15Al0.05O2 thin films. A phase diagram mapping the effect of temperature on the microstructure of LiNi0.8Co0.15Al0.05O2 thin films has been proposed. The measurements of charge-discharge profiles of Li microcells using the LiNi0.8Co0.15Al0.05O2 films grown at 450 degrees C demonstrate their possible applications in microbatteries. A stable capacity of 98 mu A h/cm(2) mu m was obtained in the potential range of 4.2-2.5 V for LiNi0.8Co0.15Al0.05O2 films grown at 450 degrees C.

Domaines: Matière Condensée [cond-mat]

C. V. Ramana, K. Zaghib, C. M. Julien. Pulsed-laser deposited LiNi0.8Co0.15Al0.05O2 thin films for application in microbatteries. Applied Physics Letters, 2007, 90 (2), pp.021916. ⟨10.1063/1.2430933⟩. ⟨hal-01281553⟩