Nano-oxidation of titanium films with large atomically flat surfaces by means of voltage-modulated scanning probe microscopy

Yannick Mugnier (1)

1 SYMME - Laboratoire SYstèmes et Matériaux pour la MEcatronique

Titanium films with large atomically flat surfaces were produced by adapting the template stripping method. The morphology of these surfaceswas characterized by contactmode atomic force microscopy and a root-mean-square roughness of 0.23 nm at a 1 μm2 area was obtained. Sample bias voltage modulation was used for nanometer-scale anodic oxidation of the Ti film. The oxide structures produced showed high reproducibility, with aspect ratios of 0.18 and 0.07 for voltage modulation and static pulse oxidation, respectively. Themaximum height of oxide structures was found at∼20 Hz voltage modulation frequency. Using a negative voltage on the sample in a combinationwith a Pt/Ir-coated tip enhanced further the aspect ratio and increased the oxide structure height. The influence of control parameters on the aspect ratio of the oxide structures was studied.

Mots clés: titanium; atomically flat surfaces; atomic force microscopy; oxidation; lithography; voltage modulation atomic force microscopy

Domaines: Génie mécanique [physics.class-ph]

Yannick Mugnier. Nano-oxidation of titanium films with large atomically flat surfaces by means of voltage-modulated scanning probe microscopy. Surface and Interface Analysis, 2002, p.490-493. ⟨hal-01266896⟩