Quantitative damage depth profiles in arsenic implanted HgCdTe

C. Lobre , D. Jalabert , Ian Vickridge (1) , Emrick Briand (1, 2, 3, 4, 5) , D. Benzeggouta (1) , L. Mollard , Pierre-Henri Jouneau , P. Ballet

1 INSP - Institut des Nanosciences de Paris
2 INSP - Institut des Nanosciences de Paris
3 INSP-E5 - Couches nanométriques : formation, interfaces, défauts
4 SAFIR - Système d'Analyse par Faisceaux d'Ions Rapides
5 SU - Sorbonne Université

Rutherford backscattering experiments under channeling conditions (RBS-c) have been carried out on Hg0.77Cd0.23Te (MCT) layers implanted with arsenic. Accurate damage profiles have been extracted through a simple formalism for implanted and annealed layers. Quantitative damage profiles are correlated with structural defects observed by bright-field scanning transmission electron microscopy (BF-STEM) and chemical composition measured by secondary ion mass spectrometry (SIMS). Evolution of damage for increasing ion implantation fluence has been investigated by these three complementary techniques. Evidence is found of irradiation induced annealing during implantation. A fast damage recovery has been observed for post-implantation thermal anneals. In the case of an implanted layer annealed during 1 h, the damage profile, associated with arsenic concentration measurements, indicates the presence of complexes involving arsenic. (C) 2013 Elsevier B.V. All rights reserved.

Mots clés: HgCdTe; Ion implantation; Damage profiles; RBS-c

Domaines: Matière Condensée [cond-mat]

C. Lobre, D. Jalabert, Ian Vickridge, Emrick Briand, D. Benzeggouta, et al.. Quantitative damage depth profiles in arsenic implanted HgCdTe. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2013, 313, pp.76-80. ⟨10.1016/j.nimb.2013.07.019⟩. ⟨hal-01237467⟩