Combining UV Lithography and an Imprinting Technique for Patterning Metal-Organic Frameworks

Cara M. Doherty (1) , Gianluca Grenci (1) , Raffaele Ricco (1) , James I. Mardel (1) , Julien Reboul (2) , Shuhei Furukawa (2) , Susumu Kitagawa (2) , Anita J. Hill (1) , Paolo Falcaro (1)

1 CSIRO - Commonwealth Scientific and Industrial Research Organisation [Canberra]
2 Institute for Integrated Cell-Material Sciences

Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

Domaines: Matériaux

Cara M. Doherty, Gianluca Grenci, Raffaele Ricco, James I. Mardel, Julien Reboul, et al.. Combining UV Lithography and an Imprinting Technique for Patterning Metal-Organic Frameworks. Advanced Materials, 2013, ⟨10.1002/adma.201301383⟩. ⟨hal-01233873⟩