A versatile wafer-scale technique for the formation of ultra-smooth and thickness-controlled graphene oxide films based on very large flakes

Renaud Cornut (1) , Stéphane Campidelli (1) , Joël Azevedo (1) , He Delong (2) , Michael Bertucchi (1) , Sébastien Sorgues (3) , Jean-Jacques Benattar , Christophe Colbeau-Justin (3) , Vincent Derycke (1)

1 LICSEN UMR 3685 - Laboratoire Innovation en Chimie des Surfaces et NanoSciences
2 SPEC - UMR3680 - Service de physique de l'état condensé
3 LCPO - Laboratoire de Chimie Physique D'Orsay

We present a new strategy to form thickness-adjusted and ultra-smooth films of very large and unwrinkled graphene oxide (GO) flakes through the transfer of both hemispherical and vertical water-films stabilized by surfactants. With its versatility in terms of substrate type (including flexible organic substrates) and in terms of flakes density (from isolated flakes to continuous and multilayer films), this wafer-scale assembly technique is adapted to a broad range of experiments involving GO and rGO (reduced graphene oxide). We illustrate its use through the evaluation of transparent rGO electrodes.

Domaines: Matériaux

Renaud Cornut, Stéphane Campidelli, Joël Azevedo, He Delong, Michael Bertucchi, et al.. A versatile wafer-scale technique for the formation of ultra-smooth and thickness-controlled graphene oxide films based on very large flakes. ACS Applied Materials & Interfaces, 2015, 7, pp.21270-201277. ⟨10.1021/acsami.5b05540⟩. ⟨hal-01228510⟩