Cryogenic etching of porous organosilicate low-k materials: Reduction of plasma induced damage

Floriane Leroy (1) , Thomas Tillocher (1) , Liping Zhang (2) , Philippe Lefaucheux (1) , Koichi Yatsuda (3) , Kaoru Maekawa (3) , Jean-Francois de Marneffe (2) , Mikhail Baklanov (2) , Remi Dussart (1)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 IMEC - IMEC
3 TEL - Tokyo Electron

Domaines: Physique des plasmas [physics.plasm-ph]

Floriane Leroy, Thomas Tillocher, Liping Zhang, Philippe Lefaucheux, Koichi Yatsuda, et al.. Cryogenic etching of porous organosilicate low-k materials: Reduction of plasma induced damage . AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States. ⟨hal-01228458⟩