Special issue on “Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III”, E-MRS Spring 2012 — Symposium W, held in Strasbourg, France, May 14–18, 2012

Mircea Modreanu (1) , Olivier Durand (2) , Gerald Jellison (3) , Giancarlo Salviati (4) , Miklos Fried (5)

1 Tyndall National Institute [Cork]
2 FOTON - Fonctions Optiques pour les Technologies de l'informatiON
3 ORNL - Oak Ridge National Laboratory [Oak Ridge]
4 UNIPR - Università degli studi di Parma = University of Parma
5 MFA - Research Institute for Technical Physics and Materials Science

This special volume of Thin Solid Films is devoted to selected papers presented at Symposium W, " Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III " , held in Strasbourg, France, May 14–18, 2012.

Domaines: Optique / photonique

Mircea Modreanu, Olivier Durand, Gerald Jellison, Giancarlo Salviati, Miklos Fried. Special issue on “Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III”, E-MRS Spring 2012 — Symposium W, held in Strasbourg, France, May 14–18, 2012. European Materials Research Society Spring Meeting 2012 (E-MRS 2012 Spring Meeting), May 2012, Strasbourg, France. pp.1-2, ⟨10.1016/j.tsf.2013.07.027⟩. ⟨hal-01166861⟩