Cryogenic etching of submicronic features in silicon using masks based on porous polymer films

Thomas Tillocher (1) , Alexane Vital (1, 2) , Marylène Vayer (2) , Nicolas Gosset (1) , Philippe Lefaucheux (1) , Christophe Sinturel (2) , Mohamed Boufnichel (3) , Remi Dussart (1)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 CRMD - Centre de Recherche sur la Matière Divisée
3 ST-CROLLES - STMicroelectronics [Crolles]

Domaines: Physique des plasmas [physics.plasm-ph]

Thomas Tillocher, Alexane Vital, Marylène Vayer, Nicolas Gosset, Philippe Lefaucheux, et al.. Cryogenic etching of submicronic features in silicon using masks based on porous polymer films . 226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico. ⟨hal-01151839⟩