Cryogenic Etching of Porous Organosilicate Low-k Materials: Fluorine based plasma analysis

Floriane Leroy (1) , Thomas Tillocher (1) , Liping Zhang (2) , A. Girard (3) , Christophe Cardinaud (3) , Philippe Lefaucheux (1) , Jean-Francois de Marneffe (2) , Remi Dussart (1) , Kaoru Maekawa (4) , Koichi Yatsuda (4) , Mikhail Baklanov (2)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 IMEC - IMEC
3 IMN - Institut des Matériaux Jean Rouxel
4 TEL - Tokyo Electron

Domaines: Physique des plasmas [physics.plasm-ph]

Floriane Leroy, Thomas Tillocher, Liping Zhang, A. Girard, Christophe Cardinaud, et al.. Cryogenic Etching of Porous Organosilicate Low-k Materials: Fluorine based plasma analysis. Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium. ⟨hal-01151528⟩