Effect of oxygen partial pressure and substrate temperature on thermoelectric properties of Ca3Co4O9-x thin films grown by Pulsed-Laser Deposition - Archive ouverte HAL Accéder directement au contenu
Poster De Conférence Année : 2015

Effect of oxygen partial pressure and substrate temperature on thermoelectric properties of Ca3Co4O9-x thin films grown by Pulsed-Laser Deposition

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Science des matériaux [cond-mat.mtrl-sci]

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https://hal.science/hal-01149155

Soumis le : mercredi 6 mai 2015-14:52:22

Dernière modification le : vendredi 24 mars 2023-14:53:00

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hal-01149155 , version 1 (06-05-2015)

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  • HAL Id : hal-01149155 , version 1

Citer

Cyril Tchiffo-Tameko, Amer Mehlem, Arnaud Stolz, Nadjib Semmar, Chantal Boulmer-Leborgne, et al.. Effect of oxygen partial pressure and substrate temperature on thermoelectric properties of Ca3Co4O9-x thin films grown by Pulsed-Laser Deposition. 34th Intern. Conf. on Thermoelectrics, 13th Europ. Conf. on Thermoelectrics, Jun 2015, Dresden, Germany. ⟨hal-01149155⟩

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