Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering

Pascal Brault (1) , Erik Neyts (2)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 PLASMANT Research Group

Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first introduce the basic magnetron sputtering background and machinery of molecular dynamics simulations, and then describe the studies conducted in this field so far. We also present a perspective view on how the field may be developed further.

Mots clés: supported cluster growth; sputter deposition; molecular dynamics; supported nanocatalyst

Domaines: Plasmas; Matériaux

Pascal Brault, Erik Neyts. Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering. Catalysis Today, 2015, 256, pp.3-12. ⟨10.1016/j.cattod.2015.02.004⟩. ⟨hal-01132394⟩