A comprehensive study of the application of the EOP techniques on bipolar devices

Abstract : In addition to Emission Microscopy, Electro-Optical Probing (EOP) technique has shown its efficiency in the world of failure analysis since the last decades and its ability to measure waveforms on various devices. The different physical parameters that affect and modify the reflected laser probing beam through active silicon components are just beginning to be well known. All the physical and environmental parameters contribute to the modulation of the reflected laser probing beam onto structures under test. However, the origins of EOP signals from bipolar transistors junctions used in a lot of analog devices are not well known and not that much described in the literature. In this paper we present backside EOP signal measurements from bipolar devices. We compare these measurements on a failed transistor and on a reference transistor and we interpret the results according to a model previously developed for silicon devices (MOS and Bipolar)
Type de document :
Article dans une revue
Microelectronics Reliability, Elsevier, 2014, 54 (9-10), pp.2088-2092
Liste complète des métadonnées

https://hal.archives-ouvertes.fr/hal-01091179
Contributeur : Frédéric Darracq <>
Soumis le : jeudi 4 décembre 2014 - 17:52:29
Dernière modification le : mercredi 29 novembre 2017 - 15:00:43

Identifiants

  • HAL Id : hal-01091179, version 1

Citation

Mohamed Mehdi Rebai, Frédéric Darracq, Jean-Paul Guillet, Bernou Elise, Kevin Sanchez, et al.. A comprehensive study of the application of the EOP techniques on bipolar devices. Microelectronics Reliability, Elsevier, 2014, 54 (9-10), pp.2088-2092. 〈hal-01091179〉

Partager

Métriques

Consultations de la notice

185