Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue The European Physical Journal D : Atomic, molecular, optical and plasma physics Année : 2010

Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas

Pascal Chabert
A. Rousseau
N. Sadeghi
  • Fonction : Auteur

Résumé

A microplasma is generated in the microhole (400 μm diameter) of a molybdenum-alumina-molybdenum sandwich (MHCD type) at medium pressure (30-200 Torr) in pure argon. Imaging and emission spectroscopy have been used to study the sheath and electron density dynamics during the stationary normal regime and the self-pulsing regime. Firstly, the evolution of the microdischarge structure is studied by recording the emission intensity of the Ar (5 p[3/2]1-4 s[3/2]1) line at 427.217 nm, and Ar+ (4 p' 2P3/2-4 s' 2D_{5/2}) line at 427.752 nm. The maximum of the Ar+ line is located in the vicinity of the sheath-plasma edge. In both regimes, the experimental observations are consistent with the position of the sheath edge calculated with an ionizing sheath model. Secondly, the electron density is recorded by monitoring the Stark broadening of the H_β-line. In the self-pulsing regime at 150 Torr, the electron density reaches its maximum value of 4 × 1015 cm-3, a few tens of ns later than the discharge current maximum. The electron density then decays with a characteristic decay time of about 2 μs, while the discharge current vanishes twice faster. The electron density in the steady-state regime is two orders of magnitude lower, at about 6-8 × 1013 cm-3.

Dates et versions

hal-01005918 , version 1 (13-06-2014)

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Claudia Lazzaroni, Pascal Chabert, A. Rousseau, N. Sadeghi. Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas. The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.555-563. ⟨10.1140/EPJD/E2010-00259-4⟩. ⟨hal-01005918⟩
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