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Article Dans Une Revue Applied physics. A, Materials science & processing Année : 2014

Dependence of ablation threshold and LIPSS formation on copper thin films by accumulative UV picosecond laser shots

Résumé

The ablation threshold and Laser-induced periodic surface structure (LIPSS) formation on copper thin film were investigated using a picosecond laser (Nd:YAG laser: 266 nm, 42 ps, 10 Hz). We show that the ablation threshold varies with respect to the number of laser shots (N) on two different substrates. The single-shot ablation threshold was estimated to be close to 170 ± 20 mJ/cm2. The incubation coefficient was estimated to be 0.68 ± 0.03 for copper thin films on silicon and glass substrates. In addition, morphology changes of the ablated regions, in the same spot area, were studied as a function of fluence and number of laser shots. An intermediate structure occurred with a mix of low spatial frequency LIPSS (LSFL), high spatial frequency LIPSS (HSFL) and regular spikes at a fluence F \ 250 mJ/cm2 and 1,000 \ N B 10.000 shots. LSFL was observed with a spatial period close to the irradiation wavelength and an orientation perpendicular to the laser polarization, and HSFL with a spatial period of *120 nm and a parallel orientation. Lastly, the global relationship between the laser parameters (i.e. fluence and number of shots) and LIPSS formation was established in the form of a 2D map.
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Dates et versions

hal-00971274 , version 1 (02-04-2014)

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Thi Trang Dai Huynh, Nadjib Semmar. Dependence of ablation threshold and LIPSS formation on copper thin films by accumulative UV picosecond laser shots. Applied physics. A, Materials science & processing, 2014, 114 (Issue 3), pp.1-6. ⟨10.1007/s00339-014-8255-0⟩. ⟨hal-00971274⟩
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