Characterization of SEM speckle pattern marking and imaging distortion by Digital Image Correlation

Abstract : Surface patterning by e-beam lithography and SEM imaging distortions are studied via digital image correlation. The global distortions from the reference pattern, which has been numerically generated, are first quantified from a digital image correlation procedure between the (virtual) reference pattern and the actual SEM image both in secondary and backscattered electron imaging modes. These distortions result from both patterning and imaging techniques. These two contributions can be separated (without resorting to an external caliper) based on images of the same patterned surface acquired at different orientations. Patterning distortions are much smaller than those due to imaging on wide field images.
Complete list of metadatas

Cited literature [25 references]  Display  Hide  Download

https://hal.archives-ouvertes.fr/hal-00947399
Contributor : François Hild <>
Submitted on : Tuesday, February 18, 2014 - 2:26:56 PM
Last modification on : Saturday, May 25, 2019 - 1:43:37 AM
Long-term archiving on : Sunday, May 18, 2014 - 10:45:45 AM

File

MST2014-ccsd.pdf
Files produced by the author(s)

Identifiers

Citation

Adrien Guery, Felix Latourte, François Hild, Stéphane Roux. Characterization of SEM speckle pattern marking and imaging distortion by Digital Image Correlation. Measurement Science and Technology, IOP Publishing, 2014, 25 (1), pp.015401. ⟨10.1088/0957-0233/25/1/015401⟩. ⟨hal-00947399⟩

Share

Metrics

Record views

234

Files downloads

442