Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Christos L. Chochos 1 Esma Ismailova 1 Cyril Brochon 2, 3 Nicolas Leclerc 1 Raluca Tiron 4 Claire Sourd 4 Philippe Bandelier 4 Johann Foucher 5 Hassan Ridaoui 6 Ali Dirani 6 Olivier Soppera 7 Damien Perret 8 Christophe Brault 1, 8 Christophe Serra 1 Georges Hadziioannou 2, 3
1 Univ Strasbourg - Ecole Europ Chim Polym & Mat, Lab Ing
2 TEAM 4 LCPO
3 LCPO - Laboratoire de Chimie des Polymères Organiques
4 CEA-LETI - Laboratoire d'Electronique et des Technologies de l'Information
5 Lithography Laboratory
6 PHOTON LRC 7228 - Photomatériaux pour l'Optique et les Nanotechnologies
7 DPG - Département de Photochimie Générale
8 Rohm et Haas Electronic Materials
Abstract : A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line-edge roughness (3 sigma) values comparable to those of the reference (commercial) resist.
Keywords : AMPLIFICATION SCANNING PROBE LITHOGRAPHY ATOMIC-FORCE MICROSCOPY RADICAL POLYMERIZATION RAFT POLYMERIZATION NM LITHOGRAPHY END-GROUPS MICROLITHOGRAPHY PHOTORESISTS COPOLYMERS
Type de document :
Article dans une revue
Advanced Materials, Wiley-VCH Verlag, 2009, 21 (10-11), pp.1121-1125. 〈10.1002/adma.200801715〉
Domaine :
Liste complète des métadonnées
https://hal.archives-ouvertes.fr/hal-00945178
Contributeur : Dominique Richard <>
Soumis le : mardi 11 février 2014 - 17:34:41
Dernière modification le : lundi 24 septembre 2018 - 10:56:04

Identifiants

Collections

CEA | INC-CNRS | DRT | LETI | SITE-ALSACE

Citation

Christos L. Chochos, Esma Ismailova, Cyril Brochon, Nicolas Leclerc, Raluca Tiron, et al.. Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances. Advanced Materials, Wiley-VCH Verlag, 2009, 21 (10-11), pp.1121-1125. 〈10.1002/adma.200801715〉. 〈hal-00945178〉

Exporter

BibTeX TEI DC DCterms EndNote

Partager

Métriques

Consultations de la notice

201

Contact

support.ccsd.cnrs.fr
hal.support@ccsd.cnrs.fr
Logo CCSD