Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Abstract : A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line-edge roughness (3 sigma) values comparable to those of the reference (commercial) resist.
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Advanced Materials, Wiley-VCH Verlag, 2009, 21 (10-11), pp.1121-1125. 〈10.1002/adma.200801715〉
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https://hal.archives-ouvertes.fr/hal-00945178
Contributeur : Dominique Richard <>
Soumis le : mardi 11 février 2014 - 17:34:41
Dernière modification le : lundi 24 septembre 2018 - 10:56:04

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Christos L. Chochos, Esma Ismailova, Cyril Brochon, Nicolas Leclerc, Raluca Tiron, et al.. Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances. Advanced Materials, Wiley-VCH Verlag, 2009, 21 (10-11), pp.1121-1125. 〈10.1002/adma.200801715〉. 〈hal-00945178〉

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