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Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Abstract : A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line-edge roughness (3 sigma) values comparable to those of the reference (commercial) resist.
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https://hal.archives-ouvertes.fr/hal-00945178
Contributor : Dominique Richard <>
Submitted on : Tuesday, February 11, 2014 - 5:34:41 PM
Last modification on : Tuesday, May 12, 2020 - 11:04:04 AM

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Christos L. Chochos, Esma Ismailova, Cyril Brochon, Nicolas Leclerc, Raluca Tiron, et al.. Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances. Advanced Materials, Wiley-VCH Verlag, 2009, 21 (10-11), pp.1121-1125. ⟨10.1002/adma.200801715⟩. ⟨hal-00945178⟩

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