Boron concentration profiling by high angle annular dark field-scanning transmission electron microscopy in homoepitaxial delta-doped diamond layers

Daniel Araújo (1) , Maria de La Paz Alegre (1) , José Carlos Pinero (1) , Alexandre Fiori (2) , Etienne Bustarret (2) , François Jomard (3)

1 DCMeIMyQI - Depto de Ciencia de los Materiales
2 NEEL - SC2G - Semi-conducteurs à large bande interdite
3 GEMAC - Groupe d'Etude de la Matière Condensée

To develop further diamond related devices, the concentration and spatial location of dopants should be controlled down to the nanometer scale. Scanning transmission electron microscopy using the high angle annular dark field mode is shown to be sensitive to boron doping in diamond epilayers. An analytical procedure is described, whereby local boron concentrations above 10^20 cm^-3 were quantitatively derived down to nanometer resolution from the signal dependence on thickness and boron content. Experimental boron local doping profiles measured on diamond p-/p++/p- multilayers are compared to macroscopic profiles obtained by secondary ion mass spectrometry, avoiding reported artefacts.

Mots clés: delta-doping; diamond; boron; HAADF; TEM

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Daniel Araújo, Maria de La Paz Alegre, José Carlos Pinero, Alexandre Fiori, Etienne Bustarret, et al.. Boron concentration profiling by high angle annular dark field-scanning transmission electron microscopy in homoepitaxial delta-doped diamond layers. Applied Physics Letters, 2013, 103 (4), pp.042104. ⟨10.1063/1.4816418⟩. ⟨hal-00851116⟩