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Article Dans Une Revue Applied Surface Science Année : 2011

Mg diffusion in K(Ta0.65Nb0.35)O3 thin films grown on MgO evidenced by Auger electron spectroscopy investigation

Quentin Simon
Valérie Bouquet
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F. Wyczisk
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G. Garry
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A. Ziaie
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Résumé

The diffusion of Mg in pulsed laser deposited K(Ta0.65Nb0.35)O3 thin films epitaxially grown on (1 0 0) MgO single crystal substrate were investigated by Auger electron spectroscopy (AES). A diffusion of Mg from the substrate into the whole thickness (400 nm) of the as-deposited K(Ta0.65Nb0.35)O3 films was observed with an accumulation of Mg at the surface. Ex situ post-annealing (750 °C/2 h) has led to a homogeneous distribution of Mg in all the ferroelectric coating. This strong reaction between film and substrate promotes a doping effect, responsible for the reduction of K(Ta0.65Nb0.35)O3 dielectric losses in comparison with films grown on other substrates.

Domaines

Matériaux

Dates et versions

hal-00822288 , version 1 (14-05-2013)

Identifiants

Citer

Quentin Simon, Valérie Bouquet, Valérie Demange, Stéphanie Députier, F. Wyczisk, et al.. Mg diffusion in K(Ta0.65Nb0.35)O3 thin films grown on MgO evidenced by Auger electron spectroscopy investigation. Applied Surface Science, 2011, 257 (22), pp.9485-9489. ⟨10.1016/j.apsusc.2011.06.041⟩. ⟨hal-00822288⟩
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