B. Tremillon and G. Letisse, Proprietes en solution dans le tetrachloroaluminate de sodium fondu I. systemes ???acide-base???, Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, vol.17, issue.3-4, p.371, 1968.
DOI : 10.1016/S0022-0728(68)80217-7

E. W. Dewing, The effect of additives on activities in cryolite melts, Metallurgical Transactions B, vol.39, issue.5, p.675, 1989.
DOI : 10.1007/BF02655924

U. Cohen and R. A. Huggins, Silicon Epitaxial Growth by Electrodeposition from Molten Fluorides, Journal of The Electrochemical Society, vol.123, issue.3, p.381, 1976.
DOI : 10.1149/1.2132829

A. D. Graves and D. Inman, Adsorption and the Differential Capacitance of the Electrical Double-layer at Platinum/Halide Metal Interfaces, Nature, vol.32, issue.5009, p.481, 1965.
DOI : 10.1016/0022-0728(61)80040-5

T. Berzins and P. Delahay, Oscillographic Polarographic Waves for the Reversible Deposition of Metals on Solid Electrodes, Journal of the American Chemical Society, vol.75, issue.3, p.555, 1953.
DOI : 10.1021/ja01099a013

P. Chamelot, P. Taxil, and B. Lafage, Voltammetric studies of tantalum electrodeposition baths, Electrochimica Acta, vol.39, issue.17, p.2571, 1994.
DOI : 10.1016/0013-4686(94)00262-2

P. Chamelot, L. Massot, L. Cassayre, and P. , Electrochemical behaviour of thorium(IV) in molten LiF???CaF2 medium on inert and reactive electrodes, Electrochimica Acta, vol.55, issue.16, p.4758, 2010.
DOI : 10.1016/j.electacta.2010.03.073