N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity

Abstract : N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP) and N2H4 as reactive gas in the temperature range 400-500 °C on various substrates. The films grown at 400 °C are amorphous and exhibit a compact structure and a smooth surface morphology. Increasing the deposition temperature first leads to the crystallization in the anatase structure (temperature range 410-450 °C) and then to the formation of rutile, so that an anatase-rutile mixture is observed in the temperature range 450-500 °C. Correlation between the structure, the morphology, optical properties, hydrophilicity and photocatalytic activity of the thin films both under UVand VIS light are presented and discussed in relation with deposition conditions.
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Florin-Daniel Duminica, Francis Maury, R. Hausbrand. N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity. Surface and Coatings Technology, Elsevier, 2007, vol. 201, pp. 9349-9353. ⟨10.1016/j.surfcoat.2007.04.061⟩. ⟨hal-00806210⟩

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