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Beneficial effect of very thin active layer on the performance of microcrystalline silicon TFT

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https://hal.archives-ouvertes.fr/hal-00804867
Contributor : Yolande Sambin <>
Submitted on : Tuesday, March 26, 2013 - 2:38:58 PM
Last modification on : Thursday, January 7, 2021 - 4:15:55 PM

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  • HAL Id : hal-00804867, version 1

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Mamadou Lamine Samb, Emmanuel Jacques, Khalid Kandoussi, Khaled Belarbi, Nathalie Coulon, et al.. Beneficial effect of very thin active layer on the performance of microcrystalline silicon TFT. ECS Transactions, Electrochemical Society, Inc., 2012, 49 (1), pp.59-67. ⟨hal-00804867⟩

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