Growth of vertically aligned arrays of carbon nanotubes for high field emission - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Thin Solid Films Année : 2008

Growth of vertically aligned arrays of carbon nanotubes for high field emission

Résumé

Vertically aligned multi-walled carbon nanotubes have been grown on Ni-coated silicon substrates, by using either direct current diode or triode plasma-enhanced chemical vapor deposition at low temperature (around 620 °C). Acetylene gas has been used as the carbon source while ammonia and hydrogen have been used for etching. However densely packed (∼ 109 cm− 2) CNTs were obtained when the pressure was ∼ 100 Pa. The alignment of nanotubes is a necessary, but not a sufficient condition in order to get an efficient electron emission: the growth of nanotubes should be controlled along regular arrays, in order to minimize the electrostatic interactions between them. So a three dimensional numerical simulation has been developed to calculate the local electric field in the vicinity of the tips for a finite square array of nanotubes and thus to calculate the maximum of the electron emission current density as a function of the spacing between nanotubes. Finally the triode plasma- enhanced process combined with pre-patterned catalyst films (using different lithography techniques) has been chosen in order to grow regular arrays of aligned CNTs with different pitches in the micrometer range. The comparison between the experimental and the simulation data permits to define the most efficient CNT-based electron field emitters
Fichier principal
Vignette du fichier
2008-TSF-Growth_of_vertically_aligned_arrays.pdf (940.92 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Loading...

Dates et versions

hal-00795364 , version 1 (02-03-2013)

Identifiants

Citer

Doyoung Kim, Sung Hoon Lim, Arnaud J Guilley, Costel Sorin Cojocaru, Jean Eric Bourée, et al.. Growth of vertically aligned arrays of carbon nanotubes for high field emission. Thin Solid Films, 2008, 516 (5), pp.706--709. ⟨10.1016/j.tsf.2007.06.089⟩. ⟨hal-00795364⟩
195 Consultations
182 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More