Temperature-Pressure-Sintering (TPS) diagram approach for sintering of silicon. - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Materials Letters Année : 2012

Temperature-Pressure-Sintering (TPS) diagram approach for sintering of silicon.

Résumé

Temperature-(water vapor) Pressure-Sintering (TPS) diagrams were established to control the microstructure evolution and densification during sintering of silicon. Experiments were performed under controlled humidified atmospheres and corroborated diagram predictions.

Domaines

Matériaux

Dates et versions

hal-00747557 , version 1 (31-10-2012)

Identifiants

Citer

J.M. Lebrun, C. Pascal, J. M. Missiaen. Temperature-Pressure-Sintering (TPS) diagram approach for sintering of silicon.. Materials Letters, 2012, 83, pp.65-68. ⟨10.1016/j.matlet.2012.06.006⟩. ⟨hal-00747557⟩
50 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More