Selective area growth and characterization of InGaN nano-disks implemented in GaN nanocolumns with different top morphologies. - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Applied Physics Letters Année : 2012

Selective area growth and characterization of InGaN nano-disks implemented in GaN nanocolumns with different top morphologies.

Résumé

This work reports on the morphology control of the selective area growth of GaN-based nanostructures on c-plane GaN templates. By decreasing the substrate temperature, the nanostructures morphology changes from pyramidal islands (no vertical m-planes), to GaN nanocolumns with top semipolar r-planes, and further to GaN nanocolumns with top polar c-planes. When growing InGaN nano-disks embedded into the GaN nanocolumns, the different morphologies mentioned lead to different optical properties, due to the semi-polar and polar nature of the r-planes and c-planes involved. These differences are assessed by photoluminescence measurements at low temperature and correlated to the specific nano-disk geometry.
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Dates et versions

hal-00704507 , version 1 (04-06-2021)

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Steven Albert, Ana Bengoechea-Encabo, Pierre Lefebvre, Francesca Barbagini, M.A. Sanchez-Garcia, et al.. Selective area growth and characterization of InGaN nano-disks implemented in GaN nanocolumns with different top morphologies.. Applied Physics Letters, 2012, 100, pp.231906. ⟨10.1063/1.4728115⟩. ⟨hal-00704507⟩
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