Conformity of aluminum thin films deposited onto micro-patterned silicon wafers by pulsed-laser deposition, magnetron sputtering, and CVD

Anne-Lise Thomann (1) , Constantin Vahlas (2) , Lyacine Aloui (2) , Diane Samelor (2) , Amaël Caillard (1) , Nurhul Shaharil (1) , Romuald Blanc (1) , Eric Millon (1)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Anne-Lise Thomann, Constantin Vahlas, Lyacine Aloui, Diane Samelor, Amaël Caillard, et al.. Conformity of aluminum thin films deposited onto micro-patterned silicon wafers by pulsed-laser deposition, magnetron sputtering, and CVD. Chemical Vapor Deposition, 2011, 17, pp.366. ⟨hal-00667922⟩