Design and fabrication of photonic crystal thin film photovoltaic cells

Abstract : We present the integration of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack including a hydrogenated amorphous silicon P-i-N junction surrounded by TCO layers, with a back metallic contact. Optical simulations exhibit a significant increase of the integrated absorption in the 300-720nm wavelength range. The global electro-optical characteristics of such a new solar cell, and the impact of surface passivation, are also discussed. Carrier generation rate maps calculated by optical simulations are introduced as input data in a commercial electrical simulation software. The fabrication of such a device is finally addressed, with a specific focus on the use of low cost nanopatterning processes compatible with large areas.
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Guillaume Gomard, Ounsi El Daif, Emmanuel Drouard, Xianqin Meng, Anne Kaminski, et al.. Design and fabrication of photonic crystal thin film photovoltaic cells. Photonics for solar energy systems III : ( 13-15 April 2010, Brussels, Belgium ) Photonics for solar energy systems No3, Bruxelles BELGIQUE (2010) SPIE Photonics Europe No03, Bruxelles BELGIQUE (2010), Apr 2010, Brussels, Belgium. pp./, ⟨10.1117/12.854383⟩. ⟨hal-00666214⟩

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