Dielectric properties of parylene AF4 as low-k material for microelectronic applications

Abdelkader Kahouli (1) , Alain Sylvestre (1) , Fathi Jomni (2) , E. André , Jean-Luc Garden (3) , Béchir Yangui (2) , B. Berge (4) , J. Legrand (4)

1 G2ELab - Laboratoire de Génie Electrique de Grenoble
2 LABMOP - Laboratory for Materials, Organization and Properties
3 NEEL - Institut Néel
4 Varioptic SA

Domaines: Energie électrique

Abdelkader Kahouli, Alain Sylvestre, Fathi Jomni, E. André, Jean-Luc Garden, et al.. Dielectric properties of parylene AF4 as low-k material for microelectronic applications. Thin Solid Films, 2012, 520 (7), pp.2493-2497. ⟨10.1016/j.tsf.2011.10.025⟩. ⟨hal-00653266⟩