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Article Dans Une Revue Applied physics. A, Materials science & processing Année : 2011

Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications

Résumé

We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400°C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show the good quality of the multilayer structure. The measurements of the EUV reflectivity around 25 nm (~49 eV) indicate that the reflectivity decreases when the annealing temperature increases above 300°C. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. Nuclear magnetic resonance used to determine the chemical state of the Co atoms and scanning electron microscopy images of cross sections of the Mg/Co multilayers reveal changes in the morphology of the stack from an annealing temperature of 305°C. This explains the observed reflectivity loss.
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Dates et versions

hal-00648899 , version 1 (06-12-2011)
hal-00648899 , version 2 (08-02-2012)

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M.-H. Hu, K. Le Guen, Jean-Michel André, S.-K. Zhou, H.-C. Li, et al.. Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications. Applied physics. A, Materials science & processing, 2011, pp.10.1007/s00339-011-6681-9. ⟨10.1007/s00339-011-6681-9⟩. ⟨hal-00648899v1⟩
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