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Communication Dans Un Congrès Année : 2010

Study of the modifications induced by plasma VUV light on photoresists for the development of cure treatments to improve etch resistance and linewidth roughness

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https://hal.science/hal-00643929

Soumis le : mercredi 23 novembre 2011-11:54:55

Dernière modification le : jeudi 4 avril 2024-21:09:39

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hal-00643929 , version 1 (23-11-2011)

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  • HAL Id : hal-00643929 , version 1

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M. Fouchier, E. Pargon, L. Azarnouche, O. Luere, K. Menguelti, et al.. Study of the modifications induced by plasma VUV light on photoresists for the development of cure treatments to improve etch resistance and linewidth roughness. International Symposium on Dry Process (DPS),, Nov 2010, Tokyo, Japan. ⟨hal-00643929⟩

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