S. D. Bernstein, T. Y. Wong, and R. W. Tustison, Comparison of the temperature dependence of the properties of ion beam and magnetron sputtered Fe films on (100) GaAs, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.17, issue.2, pp.571-576, 1999.
DOI : 10.1116/1.581620

H. Kersten, H. Deutsch, H. Steffen, G. M. Kroesen, and R. Hippler, The energy balance at substrate surfaces during plasma processing, Vacuum, vol.63, issue.3, pp.385-431, 2001.
DOI : 10.1016/S0042-207X(01)00350-5

J. G. Han, Recent progress in thin film processing by magnetron sputtering with plasma diagnostics, Journal of Physics D: Applied Physics, vol.42, issue.4, p.43001, 2009.
DOI : 10.1088/0022-3727/42/4/043001

B. Window, Recent advances in sputter deposition, Surface and Coatings Technology, vol.71, issue.2, pp.93-97, 1995.
DOI : 10.1016/0257-8972(95)80024-7

P. R. Cabarrocas, N. Chabane, A. V. Kharchenko, S. Tchakarov, and P. Phys, Polymorphous silicon thin films produced in dusty plasmas: application to solar cells, Plasma Physics and Controlled Fusion, vol.46, issue.12B, p.235, 2004.
DOI : 10.1088/0741-3335/46/12B/020

P. R. Cabarrocas, Y. Djeridane, T. Nguyen-tran, E. V. Johnson, A. Abramov et al., Low temperature plasma synthesis of silicon nanocrystals: a strategy for high deposition rate and efficient polymorphous and microcrystalline solar cells, Plasma Physics and Controlled Fusion, vol.50, issue.12, p.124037, 2008.
DOI : 10.1088/0741-3335/50/12/124037

P. R. Cabarrocas, P. Gay, and A. Hadjadj, Experimental evidence for nanoparticle deposition in continuous argon???silane plasmas: Effects of silicon nanoparticles on film properties, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.14, issue.2, pp.655-659, 1996.
DOI : 10.1116/1.580162

T. Ishigaki, T. Sato, Y. Moriyoshi, and M. I. Boulos, Influence of plasma modification of titanium carbide powder on its sintering properties, Journal of Materials Science Letters, vol.22, issue.23, pp.1694-1697, 1995.
DOI : 10.1007/BF00422678

U. Kortshagen, Nonthermal plasma synthesis of semiconductor nanocrystals, Journal of Physics D: Applied Physics, vol.42, issue.11, p.113001, 2009.
DOI : 10.1088/0022-3727/42/11/113001

E. Stoffels, W. W. Stoffels, G. Ceccone, R. Hasnaoui, H. Keune et al., MoS2 nanoparticle formation in a low pressure environment, Journal of Applied Physics, vol.86, issue.6, pp.3442-3451, 1999.
DOI : 10.1063/1.371227

L. Mangolini and U. Kortshagen, Selective nanoparticle heating: Another form of nonequilibrium in dusty plasmas, Physical Review E, vol.79, issue.2, p.26405, 2009.
DOI : 10.1103/PhysRevE.79.026405

I. Levchenko, S. Y. Huang, K. Ostrikov, and S. Xu, plasmas, Nanotechnology, vol.21, issue.2, p.25605, 2010.
DOI : 10.1088/0957-4484/21/2/025605

Z. L. Tsakadze, I. Levchenko, K. Ostrikov, and S. Xu, Plasma-assisted self-organized growth of uniform carbon nanocone arrays, Carbon, vol.45, issue.10, p.2022, 2007.
DOI : 10.1016/j.carbon.2007.05.030

S. Sriraman, S. Agarwal, E. S. Aydil, and D. Maroudas, Mechanism of hydrogen-induced crystallization of amorphous silicon, Nature, vol.30, issue.6893, p.62, 2002.
DOI : 10.1016/S0009-2614(01)00777-1

M. Wolter, I. Levchenko, H. Kersten, and K. Ostrikov, Hydrogen in plasma-nanofabrication: Selective control of nanostructure heating and passivation, Applied Physics Letters, vol.96, issue.13, p.133105, 2010.
DOI : 10.1063/1.3374324

R. Basner, F. Sigeneger, D. Loffhagen, G. Schubert, H. Fehske et al., Particles as probes for complex plasmas in front of biased surfaces, New Journal of Physics, vol.11, issue.1, p.13041, 2009.
DOI : 10.1088/1367-2630/11/1/013041

J. Goree, Charging of particles in a plasma, Plasma Sources Science and Technology, vol.3, issue.3, p.400, 1994.
DOI : 10.1088/0963-0252/3/3/025

T. Matsoukas and M. , Particle charging in low???pressure plasmas, Journal of Applied Physics, vol.77, issue.9, p.4285, 1995.
DOI : 10.1063/1.359451

V. A. Schweigert and I. V. Schweigert, Coagulation in a low-temperature plasma, Journal of Physics D: Applied Physics, vol.29, issue.3, p.655, 1996.
DOI : 10.1088/0022-3727/29/3/026

T. Matsoukas, The Coagulation Rate of Charged Aerosols in Ionized Gases, Journal of Colloid and Interface Science, vol.187, issue.2, p.474, 1997.
DOI : 10.1006/jcis.1996.4723

G. S. Selwyn, K. L. Haller, and E. F. Patterson, Trapping and behavior of particulates in a radio frequency magnetron plasma etching tool, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.11, issue.4, p.1132, 1993.
DOI : 10.1116/1.578453

H. R. Maurer, M. Hannemann, R. Basner, and H. Kersten, Measurement of plasma-surface energy fluxes in an argon rf-discharge by means of calorimetric probes and fluorescent microparticles, Physics of Plasmas, vol.17, issue.11, p.113707, 2010.
DOI : 10.1063/1.3484876

H. R. Maurer, R. Basner, and H. Kersten, Temperature of Particulates in Low-Pressure rf-Plasmas in Ar, Ar/H2 and Ar/N2 Mixtures, Contributions to Plasma Physics, vol.93, issue.9, p.954, 2010.
DOI : 10.1002/ctpp.201000022

A. Bapat, C. Anderson, C. R. Perrey, C. B. Carter, S. A. Campbell et al., Plasma synthesis of single-crystal silicon nanoparticles for novel electronic device applications, Plasma Physics and Controlled Fusion, vol.46, issue.12B, pp.97-109, 2004.
DOI : 10.1088/0741-3335/46/12B/009

J. E. Allen, Probe theory - the orbital motion approach, Physica Scripta, vol.45, issue.5, pp.497-503, 1992.
DOI : 10.1088/0031-8949/45/5/013

C. Arnas and A. A. Mouberi, Thermal balance of carbon nanoparticles in sputtering discharges, Journal of Applied Physics, vol.105, issue.6, p.63301, 2009.
DOI : 10.1063/1.3081640

F. Galli, U. Kortshagen, and I. T. , Charging, Coagulation, and Heating Model of Nanoparticles in a Low-Pressure Plasma Accounting for Ion–Neutral Collisions, IEEE Transactions on Plasma Science, vol.38, issue.4, pp.803-809, 2010.
DOI : 10.1109/TPS.2009.2035700

R. Piejak, V. Godyak, B. Alexandrovich, and N. Tishchenko, Surface temperature and thermal balance of probes immersed in high density plasma, Plasma Sources Science and Technology, vol.7, issue.4, pp.590-598, 1998.
DOI : 10.1088/0963-0252/7/4/016

S. A. Khrapak and G. E. , Grain surface temperature in noble gas discharges: Refined analytical model, Physics of Plasmas, vol.13, issue.10, p.104506, 2006.
DOI : 10.1063/1.2359282

J. E. Daugherty and D. B. Graves, Particulate temperature in radio frequency glow discharges, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.11, issue.4, pp.1126-1131, 1993.
DOI : 10.1116/1.578452

H. Maurer, R. Basner, and H. Kersten, Measuring the temperature of microparticles in plasmas, Review of Scientific Instruments, vol.79, issue.9, p.93508, 2008.
DOI : 10.1063/1.2987688

G. Swinkels, H. Kersten, H. Deutsch, and G. M. Kroesen, Microcalorimetry of dust particles in a radio-frequency plasma, Journal of Applied Physics, vol.88, issue.4, pp.1747-1755, 2000.
DOI : 10.1063/1.1302993

M. Stahl, T. Trottenberg, and H. Kersten, A calorimetric probe for plasma diagnostics, Review of Scientific Instruments, vol.81, issue.2, p.23504, 2010.
DOI : 10.1063/1.3276707

H. T. Do, H. Kersten, and R. Hippler, Interaction of injected dust particles with metastable neon atoms in a radio frequency plasma, New Journal of Physics, vol.10, issue.5, p.53010, 2008.
DOI : 10.1088/1367-2630/10/5/053010

D. Lee, L. Oksuz, and N. Hershkowitz, Exact Solution for the Generalized Bohm Criterion in a Two-Ion-Species Plasma, Physical Review Letters, vol.99, issue.15, p.155004, 2007.
DOI : 10.1103/PhysRevLett.99.155004

W. Bleakney, The Ionization Potential of Molecular Hydrogen, Physical Review, vol.40, issue.4, pp.496-501, 1932.
DOI : 10.1103/PhysRev.40.496

B. Darwent, Bond Dissociation Energies in Simple Molecules, 1970.
DOI : 10.6028/NBS.NSRDS.31

Y. Ralchenko, A. Kramida, J. Reader, and N. A. , Team: NIST Atomic Specta Database. NIST Atomic Spectra Database (version 3, 2008.

P. C. Cosby and H. Helm, Experimental determination of the H3+ bond dissociation energy, Chemical Physics Letters, vol.152, issue.1, pp.71-74, 1988.
DOI : 10.1016/0009-2614(88)87330-5

E. Neyts, M. Yan, A. Bogaerts, and R. Gijbels, Particle-in-cell/Monte Carlo simulations of a low-pressure capacitively coupled radio-frequency discharge: Effect of adding H2 to an Ar discharge, Journal of Applied Physics, vol.93, issue.9, pp.5025-5033, 2003.
DOI : 10.1063/1.1563820

B. P. Lavrov, N. Lang, A. V. Pipa, and J. Röpcke, On determination of the degree of dissociation of hydrogen in non-equilibrium plasmas by means of emission spectroscopy: II. Experimental verification, Plasma Sources Science and Technology, vol.15, issue.1, p.147, 2006.
DOI : 10.1088/0963-0252/15/1/021