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Intrinsic defects and their influence on the chemical and optical properties of TiO2x films

Abstract : In this work, TiO2 films produced by rf sputtering of a TiO2 target in argon and argon–oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range 3–20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry, x-ray photoelectron spectroscopy (XPS) and x-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS.
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Submitted on : Tuesday, March 8, 2011 - 2:52:00 AM
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N Laidani, P Cheyssac, J Perrière, R Bartali, G Gottardi, et al.. Intrinsic defects and their influence on the chemical and optical properties of TiO2x films. Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43 (48), pp.485402. ⟨10.1088/0022-3727/43/48/485402⟩. ⟨hal-00574379⟩

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