Thulium-doped silica fibers with enhanced 3H4 level lifetime : modelling the devices for 800-820 nm band - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Proceedings of SPIE, the International Society for Optical Engineering Année : 2010

Thulium-doped silica fibers with enhanced 3H4 level lifetime : modelling the devices for 800-820 nm band

Résumé

Silica-based thulium-doped fiber devices operating around 810 nm would extend the spectral range covered by high- power fiber devices. Using a comprehensive numerical model of the fiber we have shown that efficient lasing at 810 nm can be achieved for specific ranges of the laser cavity parameters in silica-based thulium-doped fibers with enhanced 3H4 lifetime up to 58 μs as measured in our highly alumina-codoped fibers. We present optimization of the thulium-doped fiber and laser cavity parameters and also potential applications of the developed host material in amplifiers and broadband sources.
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Dates et versions

hal-00561429 , version 1 (01-02-2011)

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  • HAL Id : hal-00561429 , version 1

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Pavel Peterka, Ivan Kašík, Anirban Dhar, Bernard Dussardier, Wilfried Blanc. Thulium-doped silica fibers with enhanced 3H4 level lifetime : modelling the devices for 800-820 nm band. Proceedings of SPIE, the International Society for Optical Engineering, 2010, 7843, pp.78430A-1 - 78430A-9. ⟨hal-00561429⟩
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