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Article Dans Une Revue Journal of Applied Physics Année : 2010

Characterization of inclined GaSb nanopillars by Mueller matrix ellipsometry

Résumé

Inclined GaSb nanopillars prepared by low energy ion sputtering with oblique ion beam incidence have been characterized by two different Mueller matrix ellipsometric tools. The optical properties of the nanopillars were found to be well described by a uniaxial anisotropic graded effective medium model. The pillar height and inclination angle were determined by fitting the parameters of the effective medium model to spectroscopic (1.44-2.88 eV) Mueller matrix measurements at multiple azimuth sample orientations. A set of different samples with various average pillar height and inclination angle was studied; results from the optical characterization correspond well with those from scanning electron microscopy analysis. For samples with nanopillars inclined by 45 degrees or less, the height could be determined from a single Mueller matrix measurement at only one azimuth orientation, allowing real-time in situ observation of the formation. The nanopillars were also studied using a single wavelength angle resolved Mueller polarimeter, which also can be used to determine height and inclination of the pillars, in addition to validating the optical model over a wide range of incident and azimuth angles.
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Dates et versions

hal-00533236 , version 1 (05-11-2010)

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I. S. Nerbo, Séverine Le Roy, M. Foldyna, E. Sondergard. Characterization of inclined GaSb nanopillars by Mueller matrix ellipsometry. Journal of Applied Physics, 2010, 108 (1), pp.014307. ⟨10.1063/1.3386460⟩. ⟨hal-00533236⟩
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