Atomic-scale redistribution of dopants in polycrystalline silicon layers

S. Duguay , A. Colin (1, 2) , D. Mathiot (1) , Pascal Morin (2) , D. Blavette

1 InESS - Institut d'Electronique du Solide et des Systèmes
2 ST-CROLLES - STMicroelectronics [Crolles]

S. Duguay, A. Colin, D. Mathiot, Pascal Morin, D. Blavette. Atomic-scale redistribution of dopants in polycrystalline silicon layers. Applied Physics, 2010, 108, pp.034911_1-7. ⟨hal-00526353⟩