Electron-Beam processed SAW devices for sensor applications

M. Loschonsky (1) , D. Eisele (1) , J. Masson (2) , S. Alzuaga (2) , A. Dadgar , S. Ballandras (2) , L. Reindl (1)

1 Albert-Ludwigs-Universität Freiburg
2 FEMTO-ST - Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)

In this paper, electron-beam (e-beam) lithography for processing of surface acoustic wave devices is investigated, and its suitability for large-scale processing discussed. Electron-beam lithography is used for exposure of surface acoustic wave (SAW) resonator patterns on polymethyl methacrylate (PMMA) coated piezoelectric substrates. Electron-beam lithography can be used for high frequency SAW designs, due to a minimal finger width of 100 nm to 400 nm. Such SAW devices can be used for high-frequency sensor applications. This contribution will consider processing, on-wafer characterization, and characterization of sensor effects in instrumentation applications.

Mots clés: Electron beam lithography; surface acoustic waves; sensors; high frequency

Domaines: Micro et nanotechnologies/Microélectronique; Instrumentations et Détecteurs [physics.ins-det]

M. Loschonsky, D. Eisele, J. Masson, S. Alzuaga, A. Dadgar, et al.. Electron-Beam processed SAW devices for sensor applications. 6th International Multi-Conference on Systems, Signals and Devices, Mar 2009, Djerba, Tunisia. pp.947-950, ⟨10.1109/SSD.2009.4956715⟩. ⟨hal-00486435⟩