Chemical Evolution in the Substrate due to oxidation: A Numerical Model with Explicit Treatment of Vacancy Fluxes - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Materials Science Forum Année : 2008

Chemical Evolution in the Substrate due to oxidation: A Numerical Model with Explicit Treatment of Vacancy Fluxes

Nathalie Bertrand
  • Fonction : Auteur
Clara Desgranges
Maylise Nastar
Gouenou Girardin
  • Fonction : Auteur

Résumé

To get a better understanding of oxidation behavior of Ni-base alloys in PWR primary water, a numerical model for oxide scale growth has been developed. The final aim of the model is to estimate the effects of possible changes of experimental conditions. Hence, our model has not been restricted by the classical hypothesis of quasi-steady state and can consider transient stages. The model calculates the chemical species concentration profiles, but also the vacancy concentration profiles evolution in the oxide and in the metal as a function of time. It treats the elimination of the possible supersaturated vacancies formed at the metal/oxide interface by introducing a dislocation density at the interface and in the metal bulk. This latter density can be related to the cold-working state. Its effect on the vacancy profile evolution is studied in the case of a pure metal. Eventually an extension of the present model to the oxidation of Ni-base alloys is discussed regarding a recent vacancy diffusion model adjusted on Ni-base alloys.

Domaines

Matériaux
Fichier principal
Vignette du fichier
Bertrand_2008.pdf (681.35 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-00476966 , version 1 (22-02-2024)

Identifiants

  • HAL Id : hal-00476966 , version 1

Citer

Nathalie Bertrand, Clara Desgranges, Maylise Nastar, Gouenou Girardin, Dominique Poquillon, et al.. Chemical Evolution in the Substrate due to oxidation: A Numerical Model with Explicit Treatment of Vacancy Fluxes. Materials Science Forum, 2008, vol. 595 - 598 ., 463-472 available on : http://oatao.univ-toulouse.fr/2349/1/Bertrand_2349. ⟨hal-00476966⟩
53 Consultations
1 Téléchargements

Partager

Gmail Facebook X LinkedIn More