Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO3 waveguide

K. Ghoumid (1) , R. Ferriere (1) , Badr-Eddine Benkelfat (2, 3, 4) , G. Ulliac (1) , R. Salut (1) , J.-Y. Rauch (1) , T. Gharbi (1)

1 FEMTO-ST - Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)
2 TSP - EPH - Département Electronique et Physique
3 TIPIC-SAMOVAR - Traitement de l'Information Pour Images et Communications
4 CNRS - Centre National de la Recherche Scientifique

In this paper we have studied effect of depth etching on the Bragg gratings (BGs) realized by Focused Ions Beam. This technique has the advantage to induce a direct waveguide structuring without intermediate media, comparing to traditional methods. A reflectivity of 96% within a window centred at 1550 nm is obtained. The effect of the depth etching on the transmittance and the bandwidth at half maximum is demonstrated.

Mots clés: Bragg grating; Lithium niobate; Transmittance; Focused Ions Beam

Domaines: Optique / photonique

K. Ghoumid, R. Ferriere, Badr-Eddine Benkelfat, G. Ulliac, R. Salut, et al.. Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO3 waveguide. Photonics North 2009, May 2009, Quebec, Canada. pp.738613, ⟨10.1117/12.839692⟩. ⟨hal-00472314⟩