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A simple method for measuring Si-Fin sidewall roughness by AFM

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https://hal.archives-ouvertes.fr/hal-00471972
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Submitted on : Friday, April 9, 2010 - 11:08:33 AM
Last modification on : Wednesday, March 23, 2022 - 3:50:23 PM

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X.H. Tang, V. Bayot, N. Reckinger, D. Flandre, J.P. Raskin, et al.. A simple method for measuring Si-Fin sidewall roughness by AFM. IEEE Transactions on Nanotechnology, Institute of Electrical and Electronics Engineers, 2009, 8, pp.611-616. ⟨10.1109/TNANO.2009.2021064⟩. ⟨hal-00471972⟩

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