Hyperbranched polymers for photolithographic applications towards understanding the relationship between chemical structure of polymer resin and lithographic performances

Christos L. Chochos (1) , Esma Ismailova (2) , Cyril Brochon (2) , Nicolas Leclerc (2) , Ralouca Tiron (3) , Claire Sourd (3) , Philippe Bandelier (3, 4) , Johann Foucher (3) , Hassan Ridaoui (5) , Ali Dirani (5) , Olivier Soppera (5) , Damien Perret (6) , Christophe Brault (6) , C. Serra (7) , Georges Hadziioanou (2)

1 IPC - Institute of Physical Chemistry "Demokritos"
2 Laboratoire d'Ingenierie des Polymères pour les Hautes Technologies
3 Lithography Laboratory
4 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
5 IS2M - Institut de Science des Matériaux de Mulhouse
6 Rohm et Haas Electronic Materials
7 Departament de Física i Enginyeria Nuclear

Domaines: Matériaux; Polymères

Christos L. Chochos, Esma Ismailova, Cyril Brochon, Nicolas Leclerc, Ralouca Tiron, et al.. Hyperbranched polymers for photolithographic applications towards understanding the relationship between chemical structure of polymer resin and lithographic performances. Advanced Materials, 2009, 21 (10), pp.1121-1125. ⟨10.1002/adma.200801715⟩. ⟨hal-00446619⟩