Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge

Jeremy Pereira (1) , Laurianne E. Pichon (1) , Remi Dussart (1) , Corinne Y. Duluard (1) , El-Houcine Oubensaid (1) , Hao Jiang (1) , Philippe Lefaucheux (1) , Mohamed Boufnichel (2) , Pierre Ranson (1)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 ST-CROLLES - STMicroelectronics [Crolles]

Domaines: Physique des plasmas [physics.plasm-ph]

Jeremy Pereira, Laurianne E. Pichon, Remi Dussart, Corinne Y. Duluard, El-Houcine Oubensaid, et al.. Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge. AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States. ⟨hal-00444361⟩